The growth of Cu films by pulsed laser deposition (PLD) is studied wit
h molecular dynamics simulations. We focus on examining the effects of
high momentary deposition rate and energetic particle impact in the P
LD process. Simulations show that these two factors can promote surfac
e atomic mobility and lead to 2D smooth growth of films at lower subst
rate temperature. These features are consistent with experiments. (C)
1997 Elsevier Science B.V.