Results: 1-21 |
Results: 21

Authors: Nishida, M Yukimura, K Kambara, S Maruyama, T
Citation: M. Nishida et al., NOx removal using ammonia radicals prepared by intermittent dielectric barrier discharge at atmospheric pressure, JPN J A P 1, 40(2B), 2001, pp. 1114-1117

Authors: Zhu, YC Ding, CX Yukimura, K Xiao, TD Strutt, PR
Citation: Yc. Zhu et al., Deposition and characterization of nanostructured WC-Co coating, CERAM INT, 27(6), 2001, pp. 669-674

Authors: Yukimura, K Tani, Y
Citation: K. Yukimura et Y. Tani, Generation of triggerless silicon shunting plasma and ion extraction, SURF COAT, 142, 2001, pp. 388-391

Authors: Yukimura, K
Citation: K. Yukimura, Plasma-based ion implantation and its application to three-dimensional materials, SURF COAT, 136(1-3), 2001, pp. 1-6

Authors: Yukimura, K Tani, Y Yoshioka, K
Citation: K. Yukimura et al., Shunting arc generation by co-axial electrode configuration, SURF COAT, 136(1-3), 2001, pp. 36-39

Authors: Yukimura, K Yoshioka, K Tani, Y Masamune, S
Citation: K. Yukimura et al., Shunting arc as a pulsed ion source for solid-state materials for plasma-based ion implantation, SURF COAT, 136(1-3), 2001, pp. 55-59

Authors: Tenno, N Yukimura, K Masamune, S
Citation: N. Tenno et al., Ion current analysis in pulsed RF plasma as a fundamental research of plasma-based ion implantation, SURF COAT, 136(1-3), 2001, pp. 127-131

Authors: Sano, M Teramoto, T Yukimura, K Maruyama, T
Citation: M. Sano et al., TiN coating and ion implantation of materials with three-dimensional topology in metal DC plasma-based ion implantation, SURF COAT, 136(1-3), 2001, pp. 168-171

Authors: Yamada, I Yukimura, K Horino, Y
Citation: I. Yamada et al., Proceedings of the Fifth International Workshop on Plasma-Based Ion Implantation (PBII-99) - Kyoto, Japan, 13-16 December 1999 - Preface, SURF COAT, 136(1-3), 2001, pp. IX-X

Authors: Zhu, YC Yukimura, K Ding, CX Zhang, PY
Citation: Yc. Zhu et al., Tribological properties of nanostructured and conventional WC-Co coatings deposited by plasma spraying, THIN SOL FI, 388(1-2), 2001, pp. 277-282

Authors: Nishida, M Yukimura, K Kambara, S Maruyama, T
Citation: M. Nishida et al., Reduction of nitrogen oxide in N-2 by NH3 using intermittent dielectric barrier discharge, J APPL PHYS, 90(6), 2001, pp. 2672-2677

Authors: Matsuyama, N Yukimura, K Maruyama, T
Citation: N. Matsuyama et al., Amorphous diamond-like carbon film prepared by pulsed laser deposition with application of pulsed negative bias voltage, J APPL PHYS, 89(3), 2001, pp. 1938-1941

Authors: Ishikawa, S Yukimura, K Matsunaga, K Maruyama, T
Citation: S. Ishikawa et al., Surface modification of poly(tetrafluoroethylene) film using dielectric barrier discharge of intermittent pulse voltage, JPN J A P 1, 39(9A), 2000, pp. 5223-5228

Authors: Yukimura, K Sano, M Teramoto, T Maruyama, T
Citation: K. Yukimura et al., The effect of plasma density on the deposition and ion implantation to thematerials with three-dimensional topologies in metal d.c. plasma-based ionimplantation, SURF COAT, 131(1-3), 2000, pp. 98-101

Authors: Ishikawa, S Yukimura, K Matsunaga, K Maruyama, T
Citation: S. Ishikawa et al., The surface modification of poly(tetrafluoroethylene) film using dielectric barrier discharge of intermittent pulse voltage, SURF COAT, 130(1), 2000, pp. 52-56

Authors: Sano, M Teramoto, T Yukimura, K Maruyama, T
Citation: M. Sano et al., TiN coating to three-dimensional materials by PBII using vacuum titanium arc plasma, SURF COAT, 128, 2000, pp. 245-248

Authors: Yukimura, K Yoshioka, K Tani, Y
Citation: K. Yukimura et al., Carbon shunting arc and its induced plasma, REV SCI INS, 71(2), 2000, pp. 1184-1186

Authors: Masamune, S Yukimura, K
Citation: S. Masamune et K. Yukimura, Model for ion extraction from pulsed plasma source for plasma based ion implantation (PBII), REV SCI INS, 71(2), 2000, pp. 1187-1190

Authors: Yukimura, K Sano, M Maruyama, T Kurooka, S Suzuki, Y Chayahara, A Kinomura, A Horino, Y
Citation: K. Yukimura et al., Titanium nitride prepared by plasma-based titanium-ion implantation, J VAC SCI B, 17(2), 1999, pp. 840-844

Authors: Yukimura, K Isono, R Monguchi, T Yoshioka, K Masamune, S
Citation: K. Yukimura et al., Pulsed metal ion source by triggerless shunting arc discharge, J VAC SCI B, 17(2), 1999, pp. 871-874

Authors: Sano, M Yukimura, K Maruyama, T Kurooka, S Suzuki, Y Chayahara, A Kinomura, A Horino, Y
Citation: M. Sano et al., Titanium nitride coating on implanted layer using titanium plasma based ion implantation, NUCL INST B, 148(1-4), 1999, pp. 37-41
Risultati: 1-21 |