Authors:
Ishida, M
Jung, YC
Miura, H
Koji, Y
Sawada, K
Yoshimoto, M
Keisuke, M
Takahumi, M
Hideaki, M
Citation: M. Ishida et al., Effect of Al pre-deposition layer on the epitaxial growth of silicon on Al2O3/Si (111) substrates, THIN SOL FI, 369(1-2), 2000, pp. 134-137