Results: 1-2 |
Results: 2

Authors: Sreenivasan, R Gougousi, T Xu, YH Kidder, J Zafiriou, E Rubloff, GW
Citation: R. Sreenivasan et al., Run to run control in tungsten chemical vapor deposition using H-2/WF6 at low pressures, J VAC SCI B, 19(5), 2001, pp. 1931-1941

Authors: Gougousi, T Xu, YH Kidder, JN Rubloff, GW Tilford, CR
Citation: T. Gougousi et al., Process diagnostics and thickness metrology using in situ mass spectrometry for the chemical vapor deposition of W from H-2/WF6, J VAC SCI B, 18(3), 2000, pp. 1352-1363
Risultati: 1-2 |