Results: 1-7 |
Results: 7

Authors: Hofrichter, A Constantinescu, A Benayoun, S Bulkin, P Drevillon, B
Citation: A. Hofrichter et al., Study of the mechanical behavior of plasma-deposited silica films on polycarbonate and steel, J VAC SCI A, 18(4), 2000, pp. 2012-2016

Authors: Heitz, T Hofrichter, A Bulkin, P Drevillon, B
Citation: T. Heitz et al., Real time control of plasma deposited optical filters by multiwavelength ellipsometry, J VAC SCI A, 18(4), 2000, pp. 1303-1307

Authors: Brenot, R Drevillon, B Bulkin, P Roca i Cabarrocas, P Vanderhaghen, R
Citation: R. Brenot et al., Process monitoring of semiconductor thin films and interfaces by spectroellipsometry, APPL SURF S, 154, 2000, pp. 283-290

Authors: Hofrichter, A Bulkin, P Drevillon, B
Citation: A. Hofrichter et al., In situ spectroellipsometric analysis of plasma treatments of polymers forthe adhesion improvement of silica thin films, VIDE, 54(294), 1999, pp. 393-397

Authors: Hofrichter, A Bulkin, P Drevillon, B
Citation: A. Hofrichter et al., Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor, APPL SURF S, 142(1-4), 1999, pp. 447-450

Authors: Bulkin, P Hofrichter, A Brenot, R Drevillon, B
Citation: P. Bulkin et al., Deposition of microcrystalline silicon in an integrated distributed electron cyclotron resonance PECVD reactor, THIN SOL FI, 337(1-2), 1999, pp. 37-40

Authors: Cabarrocas, PRI Brenot, R Bulkin, P Vanderhaghen, R Drevillon, B French, I
Citation: Pri. Cabarrocas et al., Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique, J APPL PHYS, 86(12), 1999, pp. 7079-7082
Risultati: 1-7 |