Results: 1-25 | 26-50 | 51-75 | 76-100 | >>
Results: 1-25/554

Authors: COLAIANNI ML CHEN PJ YATES JT
Citation: Ml. Colaianni et al., UNIQUE HYDRIDE CHEMISTRY ON SILICON-PH3 INTERACTION WITH SI(100)-(2X1), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 2995-2998

Authors: VUGTS MJM JOOSTEN GJP VANOOSTERUM A SENHORST HAJ BEIJERINCK HCW
Citation: Mjm. Vugts et al., SPONTANEOUS ETCHING OF SI(100) BY XEF2 - TEST-CASE FOR A NEW BEAM SURFACE EXPERIMENT, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 2999-3011

Authors: TAFERNER WT FREUNDLICH A BENSAOULA A IGNATIEV A WATERS K EIPERSSMITH K GUEHENNEUC M SCHULTZ JA
Citation: Wt. Taferner et al., IN-SITU OBSERVATIONS OF GE(001) AND GE SI(001) USING LOW-ENERGY ION-SCATTERING/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3012-3017

Authors: ROCHER A OUSTRY A DAVID MJ CAUMONT M
Citation: A. Rocher et al., CRSI2 SI(III) - GROWTH OF MONOTYPE DOMAINS BY SOLID-PHASE EPITAXY ON A VICINAL SURFACE/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3018-3022

Authors: WECK G WANDEL K
Citation: G. Weck et K. Wandel, DIFFUSION AND ELECTRICAL-ACTIVITY OF INDIUM IN (HG,CD)TE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3023-3032

Authors: CHUA LH JACKMAN RB FOORD JS CHALKER PR JOHNSTON C ROMANI S
Citation: Lh. Chua et al., INTERACTION OF HYDROGEN WITH CHEMICAL-VAPOR-DEPOSITION DIAMOND SURFACES - A THERMAL-DESORPTION STUDY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3033-3039

Authors: LUCAS SR PARTLOW WD CHOYKE WJ YATES JT
Citation: Sr. Lucas et al., GA-CH3 BOND SCISSION BY ATOMIC-H - THE DEPLETION OF SURFACE CARBON FROM A GALLIUM ALKYL FILM ON SILICON DIOXIDE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3040-3047

Authors: FREIRE FL ACHETE CA MARIOTTO G CANTERI R
Citation: Fl. Freire et al., AMORPHOUS NITROGENATED CARBON-FILMS - STRUCTURAL MODIFICATIONS INDUCED BY THERMAL ANNEALING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3048-3053

Authors: SCHULZE RK TAYLOR TN PAFFETT MT
Citation: Rk. Schulze et al., AL DEPOSITION ON FE - FORMATION OF AN IRON ALUMINIDE SURFACE ALLOY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3054-3061

Authors: KIM J WEIMER JJ ZUKIC M TORR DG
Citation: J. Kim et al., DEPTH PROFILING ANALYSIS OF ALUMINUM OXIDATION DURING FILM DEPOSITIONIN A CONVENTIONAL HIGH-VACUUM SYSTEM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3062-3067

Authors: INOUE A OKAMOTO M AKAGI Y KOBA M
Citation: A. Inoue et al., PREPARATION OF HIGHLY ORIENTED THIN-FILM OF NONLINEAR-OPTICAL MATERIAL BY VACUUM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3068-3073

Authors: KESTER DJ AILEY KS LICHTENWALNER DJ DAVIS RF
Citation: Dj. Kester et al., GROWTH AND CHARACTERIZATION OF CUBIC BORON-NITRIDE THIN-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3074-3081

Authors: LEON M DIAZ R RUEDA F
Citation: M. Leon et al., COMPOSITION EFFECTS IN FLASH EVAPORATED CUIN(SEXTE1-X)(2) FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3082-3086

Authors: MARX WF RA YJ YANG R CHEN CH
Citation: Wf. Marx et al., PLASMA AND PROCESSING EFFECTS OF ELECTRODE SPACING FOR TUNGSTEN ETCHBACK USING A BIPOLAR ELECTROSTATIC WAFER CLAMP, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3087-3090

Authors: WHANG KW LEE SH DOH HH KIM JS
Citation: Kw. Whang et al., DAMAGE AND CONTAMINATION IN LOW-TEMPERATURE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ETCHING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3091-3094

Authors: BELL FH JOUBERT O OEHRLEIN GS ZHANG Y VENDER D
Citation: Fh. Bell et al., INVESTIGATION OF SELECTIVE SIO2-TO-SI ETCHING IN AN INDUCTIVELY-COUPLED HIGH-DENSITY PLASMA USING FLUOROCARBON GASES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3095-3101

Authors: HAVERLAG M STOFFELS E STOFFELS WW KROESEN GMW DEHOOG FJ
Citation: M. Haverlag et al., MEASUREMENTS OF RADICAL DENSITIES IN RADIOFREQUENCY FLUOROCARBON PLASMAS USING INFRARED-ABSORPTION SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3102-3108

Authors: OKA Y ANDO A KANEKO O TAKEIRI Y TSUMORI K AKIYAMA R KAWAMOTO T
Citation: Y. Oka et al., CHARACTERIZATION OF H- EXTRACTION FOR A MULTIPOLE ION-SOURCE LOCATED IN THE TAIL OF THE MAGNETIC-FIELD DISTRIBUTION - TYPE-III, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3109-3114

Authors: FUSSELMAN SP YASUDA HK JAVEDANI JB CHIANG J PRELAS MA
Citation: Sp. Fusselman et al., SPATIAL DISTRIBUTIONS OF ELECTRON-DENSITY AND TEMPERATURE IN AUDIO FREQUENCY AND RADIO-FREQUENCY MAGNETRON GLOW-DISCHARGES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3115-3119

Authors: GOECKNER MJ HENDERSON MA MEYER JA BREUN RA
Citation: Mj. Goeckner et al., FOURIER-TRANSFORM INFRARED-ABSORPTION SPECTROMETRY MEASUREMENTS OF A CF4 DISCHARGE IN AN ELECTRON-CYCLOTRON-RESONANCE REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3120-3125

Authors: MUTSUKURA N FUKASAWA Y MACHI Y KUBOTA T
Citation: N. Mutsukura et al., DIAGNOSTICS AND CONTROL OF RADIOFREQUENCY GLOW-DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3126-3130

Authors: REEVE SW WEIMER WA
Citation: Sw. Reeve et Wa. Weimer, PLASMA DIAGNOSTICS OF A DIRECT-CURRENT ARCJET DIAMOND REACTOR .1. ELECTROSTATIC-PROBE ANALYSIS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3131-3136

Authors: PRABURAM G GOREE J
Citation: G. Praburam et J. Goree, OBSERVATIONS OF PARTICLE LAYERS LEVITATED IN A RADIOFREQUENCY SPUTTERING PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3137-3145

Authors: WALLACE JL
Citation: Jl. Wallace, CORROSION BEHAVIOR OF SPUTTERED AMORPHOUS MAGNETIC THIN-FILMS, WITH AND WITHOUT PROTECTIVE OVERLAYERS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3146-3148

Authors: COMEDI D FAJARDO F CHAMBOULEYRON I TABACNIKS M
Citation: D. Comedi et al., ESTIMATION OF INDIUM-TO-GERMANIUM AND GALLIUM-TO-GERMANIUM SPUTTERINGYIELD RATIOS USING COSPUTTERING DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3149-3151
Risultati: 1-25 | 26-50 | 51-75 | 76-100 | >>