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Authors: AYDIL ES GREGUS JA GOTTSCHO RA
Citation: Es. Aydil et al., MULTIPLE STEADY-STATES IN ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTORS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2883-2892

Authors: BOWDEN MD KIMURA F MUTA H UCHINO K MURAOKA K MAEDA M
Citation: Md. Bowden et al., STUDY OF THE EFFECT OF A PROBE ON THE PLASMA IN THE SOURCE REGION OF AN ELECTRON-CYCLOTRON-RESONANCE DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2893-2896

Authors: CAUGHMAN JBO HOLBER WM
Citation: Jbo. Caughman et Wm. Holber, EFFECTS OF SUBSTRATE BIAS FREQUENCY IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2897-2902

Authors: HOLBER WM LOGAN JS GRABARZ HJ YEH JTC CAUGHMAN JBO SUGERMAN A TURENE FE
Citation: Wm. Holber et al., COPPER DEPOSITION BY ELECTRON-CYCLOTRON-RESONANCE PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2903-2910

Authors: RA YJ CHEN CH
Citation: Yj. Ra et Ch. Chen, DIRECT-CURRENT BIAS AS AN ION CURRENT MONITOR IN THE TRANSFORMER COUPLED PLASMA ETCHER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2911-2913

Authors: LIAN S FOWLER B KRISHNAN S JUNG L LI C MANNA I SAMARA D BANERJEE S
Citation: S. Lian et al., PHOTO-ENHANCED CHEMICAL-VAPOR-DEPOSITION - SYSTEM-DESIGN CONSIDERATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2914-2923

Authors: HESZLER P CARLSSON JO MOGYOROSI P
Citation: P. Heszler et al., REACTION PATHWAYS FOR ARF EXCIMER-LASER ASSISTED TUNGSTEN CHEMICAL-VAPOR-DEPOSITION FROM A WF6-H2 GAS-MIXTURE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2924-2930

Authors: BU Y MA L LIN MC
Citation: Y. Bu et al., LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF INN ON SI(100), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2931-2937

Authors: LIU XH ZHENG ZH HUANG W LIN ZX WANG X YANG GQ ZOU SC
Citation: Xh. Liu et al., INFLUENCE OF ION-BEAM MODIFICATION ON THE OXIDATION BEHAVIOR OF INTERMETALLIC COMPOUND NI3AL(0.1B), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2938-2940

Authors: ONYIRIUKA EC
Citation: Ec. Onyiriuka, EFFECTS OF O2, AIR, AND CF4 PLASMAS ON POLY(ETHERKETONE) SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2941-2944

Authors: FALCONY C ALONSO JC ORTIZ A GARCIA M ZIRONI EP RICKARDS J
Citation: C. Falcony et al., HIGH-QUALITY, HIGH DEPOSITION RATE SIO2-FILMS AT LOW-TEMPERATURES USING SILICON FLUORIDES AND PLASMA-ASSISTED DEPOSITION TECHNIQUES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2945-2949

Authors: SAKAI A TATSUMI T ISHIDA K
Citation: A. Sakai et al., GROWTH-KINETICS OF SI HEMISPHERICAL GRAINS ON CLEAN AMORPHOUS-SI SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2950-2953

Authors: CHARLES C GIROULTMATLAKOWSKI G BOSWELL RW GOULLET A TURBAN G CARDINAUD C
Citation: C. Charles et al., CHARACTERIZATION OF SILICON DIOXIDE FILMS DEPOSITED AT LOW-PRESSURE AND TEMPERATURE IN A HELICON DIFFUSION REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2954-2963

Authors: HE XM LI WZ LI HD
Citation: Xm. He et al., STRUCTURE AND TRIBOLOGY OF HARD CARBON-FILMS SYNTHESIZED BY ION-BEAM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2964-2969

Authors: BURNETT AF CECH JM
Citation: Af. Burnett et Jm. Cech, RELATIONSHIP OF CRYSTALLOGRAPHIC ORIENTATION AND IMPURITIES TO STRESS, RESISTIVITY, AND MORPHOLOGY FOR SPUTTERED COPPER-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2970-2974

Authors: SATO H MINAMI T TAKATA S
Citation: H. Sato et al., HIGHLY TRANSPARENT AND CONDUCTIVE GROUP-IV IMPURITY-DOPED ZNO THIN-FILMS PREPARED BY RADIO-FREQUENCY MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2975-2979

Authors: POSADOWSKI WM RADZIMSKI ZJ
Citation: Wm. Posadowski et Zj. Radzimski, SUSTAINED SELF-SPUTTERING USING A DIRECT-CURRENT MAGNETRON SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2980-2984

Authors: ALBERTINETTI N MINDEN HT
Citation: N. Albertinetti et Ht. Minden, SPUTTER DISTRIBUTION OF A LARGE-SCALE ION-BEAM COATER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2985-2988

Authors: GLOCKER DA
Citation: Da. Glocker, INFLUENCE OF THE PLASMA ON SUBSTRATE HEATING DURING LOW-FREQUENCY REACTIVE SPUTTERING OF ALN, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2989-2993

Authors: MATSUOKA M HOSHINO K ONO K
Citation: M. Matsuoka et al., DIAMOND SYNTHESIS BY SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2994-3001

Authors: SMENTKOWSKI VS YATES JT
Citation: Vs. Smentkowski et Jt. Yates, TEMPERATURE CONTROL AND MEASUREMENT FOR DIAMOND SINGLE-CRYSTALS IN ULTRAHIGH-VACUUM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3002-3006

Authors: LEE HJ ZUBECK R HOLLARS D LEE JK SMALLEN M CHAO A
Citation: Hj. Lee et al., MATERIAL PROPERTIES AND TRIBOLOGICAL PERFORMANCE OF HYDROGENATED SPUTTER CARBON OVERCOAT ON RIGID DISK, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3007-3013

Authors: FISTER L LI XM MCCONNELL J NOVET T JOHNSON DC
Citation: L. Fister et al., DEPOSITION SYSTEM FOR THE SYNTHESIS OF MODULATED, ULTRATHIN-FILM COMPOSITES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3014-3019

Authors: CHOI BI ANDERSON AC WESTERHEIM AC FLIK MI
Citation: Bi. Choi et al., IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3020-3025

Authors: SIMMONDS MG GLADFELTER WL LI HJ MCMURRY PH
Citation: Mg. Simmonds et al., PARTICLE CONTAMINATION IN LOW-PRESSURE ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION REACTORS - METHODS OF PARTICLE-DETECTION AND CAUSES OF PARTICLE FORMATION USING A LIQUID ALANE (ALH3) PRECURSOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3026-3033
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