Citation: Es. Aydil et al., MULTIPLE STEADY-STATES IN ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTORS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2883-2892
Authors:
BOWDEN MD
KIMURA F
MUTA H
UCHINO K
MURAOKA K
MAEDA M
Citation: Md. Bowden et al., STUDY OF THE EFFECT OF A PROBE ON THE PLASMA IN THE SOURCE REGION OF AN ELECTRON-CYCLOTRON-RESONANCE DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2893-2896
Citation: Jbo. Caughman et Wm. Holber, EFFECTS OF SUBSTRATE BIAS FREQUENCY IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2897-2902
Authors:
HOLBER WM
LOGAN JS
GRABARZ HJ
YEH JTC
CAUGHMAN JBO
SUGERMAN A
TURENE FE
Citation: Wm. Holber et al., COPPER DEPOSITION BY ELECTRON-CYCLOTRON-RESONANCE PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2903-2910
Citation: Yj. Ra et Ch. Chen, DIRECT-CURRENT BIAS AS AN ION CURRENT MONITOR IN THE TRANSFORMER COUPLED PLASMA ETCHER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2911-2913
Authors:
LIAN S
FOWLER B
KRISHNAN S
JUNG L
LI C
MANNA I
SAMARA D
BANERJEE S
Citation: S. Lian et al., PHOTO-ENHANCED CHEMICAL-VAPOR-DEPOSITION - SYSTEM-DESIGN CONSIDERATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2914-2923
Citation: P. Heszler et al., REACTION PATHWAYS FOR ARF EXCIMER-LASER ASSISTED TUNGSTEN CHEMICAL-VAPOR-DEPOSITION FROM A WF6-H2 GAS-MIXTURE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2924-2930
Citation: Y. Bu et al., LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF INN ON SI(100), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2931-2937
Authors:
LIU XH
ZHENG ZH
HUANG W
LIN ZX
WANG X
YANG GQ
ZOU SC
Citation: Xh. Liu et al., INFLUENCE OF ION-BEAM MODIFICATION ON THE OXIDATION BEHAVIOR OF INTERMETALLIC COMPOUND NI3AL(0.1B), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2938-2940
Citation: Ec. Onyiriuka, EFFECTS OF O2, AIR, AND CF4 PLASMAS ON POLY(ETHERKETONE) SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2941-2944
Authors:
FALCONY C
ALONSO JC
ORTIZ A
GARCIA M
ZIRONI EP
RICKARDS J
Citation: C. Falcony et al., HIGH-QUALITY, HIGH DEPOSITION RATE SIO2-FILMS AT LOW-TEMPERATURES USING SILICON FLUORIDES AND PLASMA-ASSISTED DEPOSITION TECHNIQUES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2945-2949
Citation: A. Sakai et al., GROWTH-KINETICS OF SI HEMISPHERICAL GRAINS ON CLEAN AMORPHOUS-SI SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2950-2953
Authors:
CHARLES C
GIROULTMATLAKOWSKI G
BOSWELL RW
GOULLET A
TURBAN G
CARDINAUD C
Citation: C. Charles et al., CHARACTERIZATION OF SILICON DIOXIDE FILMS DEPOSITED AT LOW-PRESSURE AND TEMPERATURE IN A HELICON DIFFUSION REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2954-2963
Citation: Xm. He et al., STRUCTURE AND TRIBOLOGY OF HARD CARBON-FILMS SYNTHESIZED BY ION-BEAM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2964-2969
Citation: Af. Burnett et Jm. Cech, RELATIONSHIP OF CRYSTALLOGRAPHIC ORIENTATION AND IMPURITIES TO STRESS, RESISTIVITY, AND MORPHOLOGY FOR SPUTTERED COPPER-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2970-2974
Citation: H. Sato et al., HIGHLY TRANSPARENT AND CONDUCTIVE GROUP-IV IMPURITY-DOPED ZNO THIN-FILMS PREPARED BY RADIO-FREQUENCY MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2975-2979
Citation: Wm. Posadowski et Zj. Radzimski, SUSTAINED SELF-SPUTTERING USING A DIRECT-CURRENT MAGNETRON SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2980-2984
Citation: N. Albertinetti et Ht. Minden, SPUTTER DISTRIBUTION OF A LARGE-SCALE ION-BEAM COATER, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2985-2988
Citation: Da. Glocker, INFLUENCE OF THE PLASMA ON SUBSTRATE HEATING DURING LOW-FREQUENCY REACTIVE SPUTTERING OF ALN, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2989-2993
Citation: M. Matsuoka et al., DIAMOND SYNTHESIS BY SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2994-3001
Citation: Vs. Smentkowski et Jt. Yates, TEMPERATURE CONTROL AND MEASUREMENT FOR DIAMOND SINGLE-CRYSTALS IN ULTRAHIGH-VACUUM, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3002-3006
Authors:
LEE HJ
ZUBECK R
HOLLARS D
LEE JK
SMALLEN M
CHAO A
Citation: Hj. Lee et al., MATERIAL PROPERTIES AND TRIBOLOGICAL PERFORMANCE OF HYDROGENATED SPUTTER CARBON OVERCOAT ON RIGID DISK, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3007-3013
Authors:
FISTER L
LI XM
MCCONNELL J
NOVET T
JOHNSON DC
Citation: L. Fister et al., DEPOSITION SYSTEM FOR THE SYNTHESIS OF MODULATED, ULTRATHIN-FILM COMPOSITES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3014-3019
Authors:
CHOI BI
ANDERSON AC
WESTERHEIM AC
FLIK MI
Citation: Bi. Choi et al., IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3020-3025
Authors:
SIMMONDS MG
GLADFELTER WL
LI HJ
MCMURRY PH
Citation: Mg. Simmonds et al., PARTICLE CONTAMINATION IN LOW-PRESSURE ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION REACTORS - METHODS OF PARTICLE-DETECTION AND CAUSES OF PARTICLE FORMATION USING A LIQUID ALANE (ALH3) PRECURSOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3026-3033