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Results: 101-125/4497

Authors: Kiyota, Y Inada, T
Citation: Y. Kiyota et T. Inada, Sticking coefficient of boron and phosphorus on silicon during vapor-phasedoping, J VAC SCI A, 19(5), 2001, pp. 2441-2445

Authors: Aanesland, A Fredriksen, A
Citation: A. Aanesland et A. Fredriksen, Pressure dependent mode transition in an electron cyclotron resonance plasma discharge, J VAC SCI A, 19(5), 2001, pp. 2446-2452

Authors: Khakifirooz, A Mohajerzadeh, S Haji, S
Citation: A. Khakifirooz et al., Field-assisted metal-induced crystallization of amorphous silicon films, J VAC SCI A, 19(5), 2001, pp. 2453-2455

Authors: Magill, DP Ogwu, AA McLaughlin, JA Maguire, PD McCullough, RW Voulot, D Gillen, D
Citation: Dp. Magill et al., Electrical characteristics of nitrogen incorporated hydrogenated amorphouscarbon, J VAC SCI A, 19(5), 2001, pp. 2456-2462

Authors: Yang, SH Yokoyama, M
Citation: Sh. Yang et M. Yokoyama, Enhanced luminance of ZnGa2O4 phosphor by In2O3 doping, J VAC SCI A, 19(5), 2001, pp. 2463-2467

Authors: Kondo, T Tomii, T Yagyu, S Yamamoto, S
Citation: T. Kondo et al., Rainbow scattering of CH4 and C2H6 molecular beams from a LiF(001) surface: Dependence on incident kinetic energy and molecular anisotropy, J VAC SCI A, 19(5), 2001, pp. 2468-2470

Authors: Ma, ZH Tan, KL Alian, AD Kang, ET Neoh, KG
Citation: Zh. Ma et al., Electroless plating of copper on poly(tetrafluoroethylene) films modified by NH3 plasma and surface graft copolymerization with aniline, J VAC SCI A, 19(5), 2001, pp. 2471-2478

Authors: Yamada, Y Uyama, H Murata, T Nozoye, H
Citation: Y. Yamada et al., Low temperature deposition of titanium-oxide films with high refractive indices by oxygen-radical beam assisted evaporation combined with ion beams, J VAC SCI A, 19(5), 2001, pp. 2479-2482

Authors: Joseph, EA Gross, C Liu, HY Laaksonen, RT Celii, FG
Citation: Ea. Joseph et al., Characterization of silicon-rich nitride and oxynitride films for polysilicon gate patterning. I. Physical, characterization, J VAC SCI A, 19(5), 2001, pp. 2483-2489

Authors: Kim, JP Davidson, MR Speck, B Moorehead, DJ Zhai, Q Holloway, PH
Citation: Jp. Kim et al., ZnS : TbOF thin films sputter deposited from a single versus separate, ZnSand TbOF targets, J VAC SCI A, 19(5), 2001, pp. 2490-2493

Authors: Makihara, K Yang, JP Shi, J Hashimoto, M Maruyama, S Barna, A
Citation: K. Makihara et al., Growth and structure of Ni films radio frequency sputter deposited on GaAs(001) covered with Ti film, J VAC SCI A, 19(5), 2001, pp. 2494-2498

Authors: Sazhin, OV Borisov, SF Sharipov, F
Citation: Ov. Sazhin et al., Accommodation coefficient of tangential momentum on atomically clean and contaminated surfaces, J VAC SCI A, 19(5), 2001, pp. 2499-2503

Authors: Lee, KH Park, C Yoon, Y Lee, JJ Jehn, HA
Citation: Kh. Lee et al., Corrosion behaviors of CrNx and (Ti1-xCrx)N coatings produced by ion plating, J VAC SCI A, 19(5), 2001, pp. 2504-2513

Authors: Franz, G Lange, B Sotier, S
Citation: G. Franz et al., Characterization of sputtered indium tin oxide layers as transparent contact material, J VAC SCI A, 19(5), 2001, pp. 2514-2521

Authors: Tripathy, S Ramam, A Chua, SJ Pan, JS Huan, A
Citation: S. Tripathy et al., Characterization of inductively coupled plasma etched surface of GaN usingCl-2/BCl3 chemistry, J VAC SCI A, 19(5), 2001, pp. 2522-2532

Authors: Sternovsky, Z Horanyi, M Robertson, S
Citation: Z. Sternovsky et al., Charging of dust particles on surfaces, J VAC SCI A, 19(5), 2001, pp. 2533-2541

Authors: Tsang, MP Ong, CW Chong, N Choy, CL Lim, PL Hung, WW
Citation: Mp. Tsang et al., Mechanical and etching properties of dual ion beam deposited hydrogen-freesilicon nitride films, J VAC SCI A, 19(5), 2001, pp. 2542-2548

Authors: Kim, HK Ok, YW Seong, TY Jeon, EJ Cho, W Yoon, YS
Citation: Hk. Kim et al., Microstructures and electrochemical properties of Pt-doped amorphous V2O5 cathode films for thin film microbatteries, J VAC SCI A, 19(5), 2001, pp. 2549-2553

Authors: Shaginyan, LR Misina, M Kadlec, S Jastrabik, L Mackova, A Perina, V
Citation: Lr. Shaginyan et al., Mechanism of the film composition formation during magnetron sputtering ofWTi, J VAC SCI A, 19(5), 2001, pp. 2554-2566

Authors: Popova, E Keller, N Gendron, F Thomas, L Brianso, MC Guyot, M Tessier, M Parkin, SSP
Citation: E. Popova et al., Perpendicular magnetic anisotropy in ultrathin yttrium iron garnet films prepared by pulsed laser deposition technique, J VAC SCI A, 19(5), 2001, pp. 2567-2570

Authors: Mizuno, Y Tanaka, A Takahiro, K Takano, T Yamauchi, Y Okada, T Yamaguchi, S Homma, T
Citation: Y. Mizuno et al., Hydrogen outgasing from titanium-modified layers with various surface treatments, J VAC SCI A, 19(5), 2001, pp. 2571-2577

Authors: Bohme, O Yang, S Teer, DG Albella, JM Roman, E
Citation: O. Bohme et al., Composition profile of heat treated carbon nitride hard coatings, J VAC SCI A, 19(5), 2001, pp. 2578-2580

Authors: Palasantzas, G van Agterveld, DTL Koch, SA De Hosson, JTM
Citation: G. Palasantzas et al., Influence of electron flux on the oxidation of Ni3Al surfaces, J VAC SCI A, 19(5), 2001, pp. 2581-2585

Authors: Arnold, T Boehm, G Schindler, A
Citation: T. Arnold et al., Ultrahigh-rate plasma jet chemical etching of silicon, J VAC SCI A, 19(5), 2001, pp. 2586-2589

Authors: Okraku-Yirenkyi, Y Sung, YM Otsubo, M Honda, C Sakoda, T
Citation: Y. Okraku-yirenkyi et al., Experimental and numerical analyses of electron temperature and density distributions in a magnetic neutral loop discharge plasma, J VAC SCI A, 19(5), 2001, pp. 2590-2595
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