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Results: 26-50/4497

Authors: Zeng, XC Tong, HH Fu, RKY Chu, PK Xu, ZJ Chen, QC
Citation: Xc. Zeng et al., Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source, J VAC SCI A, 19(6), 2001, pp. 2889-2892

Authors: Xu, SL Lill, T Podlesnik, D
Citation: Sl. Xu et al., Wall-dependent etching characteristics of organic antireflection coating in O-2+halogen/hydrogen halide plasma, J VAC SCI A, 19(6), 2001, pp. 2893-2899

Authors: Chang, YW Jou, RY
Citation: Yw. Chang et Ry. Jou, Analytic expressions of the speed factor for turbomolecular pumps, J VAC SCI A, 19(6), 2001, pp. 2900-2904

Authors: Hayashi, K Ohta, E Wada, H
Citation: K. Hayashi et al., Effect of substrate-film lattice mismatch in La0.7Ba0.3MnO3-delta thin films for transport properties, J VAC SCI A, 19(6), 2001, pp. 2905-2909

Authors: Whitacre, JF Yalisove, SM Bilello, JC
Citation: Jf. Whitacre et al., Real-time/in situ diffraction study of phase and microstructural evolutionin sputtered beta-Ta/Ta2O5 films, J VAC SCI A, 19(6), 2001, pp. 2910-2919

Authors: Terranova, ML Sessa, V Piccirillo, S Rossi, M Valeri, S Materassi, M
Citation: Ml. Terranova et al., Diamond-based composite layers as protective coatings for ion beam extraction systems, J VAC SCI A, 19(6), 2001, pp. 2920-2924

Authors: Benvenuti, C Chiggiato, P Mongelluzzo, A Prodromides, A Ruzinov, V Scheuerlein, C Taborelli, M Levy, F
Citation: C. Benvenuti et al., Influence of the elemental composition and crystal structure on the vacuumproperties of Ti-Zr-V nonevaporable getter films, J VAC SCI A, 19(6), 2001, pp. 2925-2930

Authors: Takagi, K Makimoto, T Hiraiwa, H Negishi, T
Citation: K. Takagi et al., Photocatalytic, antifogging mirror, J VAC SCI A, 19(6), 2001, pp. 2931-2935

Authors: Chen, W Sugita, K Morikawa, Y Yasunami, S Hayashi, T Uchida, T
Citation: W. Chen et al., Application of magnetic neutral loop discharge plasma in deep silica etching, J VAC SCI A, 19(6), 2001, pp. 2936-2940

Authors: Kim, TW Weiss, MJ Hagedorn, CJ Weinberg, WH
Citation: Tw. Kim et al., Reaction of gas-phase atomic hydrogen with NO on Ru(001), J VAC SCI A, 19(6), 2001, pp. 2941-2945

Authors: Schaepkens, M Martini, I Sanjuan, EA Li, X Oehrlein, GS Perry, WL Anderson, HM
Citation: M. Schaepkens et al., Gas-phase studies in inductively coupled fluorocarbon plasmas, J VAC SCI A, 19(6), 2001, pp. 2946-2957

Authors: Liu, B Zhang, GL Cheng, DJ Liu, CZ He, R Yang, SZ
Citation: B. Liu et al., Inner surface coating of TiN by the grid-enhanced plasma source ion implantation technique, J VAC SCI A, 19(6), 2001, pp. 2958-2962

Authors: Kurokouchi, S Morita, S Okabe, M
Citation: S. Kurokouchi et al., Characteristics of a taper-seal type gasket for the Conflat (R) sealing system, J VAC SCI A, 19(6), 2001, pp. 2963-2967

Authors: Shang, NG Lee, CH Zhou, XT Meng, FY Chan, CY Lee, ST Bello, I
Citation: Ng. Shang et al., Investigation of diamond film deposition on steel without and with ion beam nitriding pretreatment, J VAC SCI A, 19(6), 2001, pp. 2968-2973

Authors: Lee, WH Ko, YK Byun, IJ Seo, BS Lee, JG Reucroft, PJ Lee, JU Lee, JY
Citation: Wh. Lee et al., Chemical vapor deposition of an electroplating Cu seed layer using hexafluoroacetylacetonate Cu(1,5-dimethylcyclooctadiene), J VAC SCI A, 19(6), 2001, pp. 2974-2978

Authors: Shi, J Zhou, R Hashimoto, M
Citation: J. Shi et al., Preferential resputtering phenomenon on the surface of (100)-oriented Ni-Pt films: Effect of substrate bias during sputter deposition, J VAC SCI A, 19(6), 2001, pp. 2979-2981

Authors: Smentkowski, VS Linsebigler, AL
Citation: Vs. Smentkowski et Al. Linsebigler, Reduction of artifacts in temperature programmed desorption measurements of field generated, real-life, powered samples, J VAC SCI A, 19(6), 2001, pp. 2982-2986

Authors: Nonogaki, R Yamada, S Ibukiyama, M Wada, T
Citation: R. Nonogaki et al., Synthesis of BNx-SiNy composite films by multisource plasma chemical vapordeposition, J VAC SCI A, 19(5), 2001, pp. 2039-2042

Authors: Choi, SK Lee, JI
Citation: Sk. Choi et Ji. Lee, Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering, J VAC SCI A, 19(5), 2001, pp. 2043-2047

Authors: Zhang, T Song, JH Tian, XB Chu, PK Brown, IG
Citation: T. Zhang et al., Dynamic mixing deposition of niobium nitride films by cathodic are plasma in ambient nitrogen, J VAC SCI A, 19(5), 2001, pp. 2048-2050

Authors: Guasch, C Doukkali, A Bonnet, J
Citation: C. Guasch et al., Low temperature work function variations of the Au/GaSb (110) interface: Experimental results and theoretical model, J VAC SCI A, 19(5), 2001, pp. 2051-2054

Authors: Takahashi, K Tachibana, K
Citation: K. Takahashi et K. Tachibana, Solid particle production in fluorocarbon plasmas. I. Correlation with polymer film deposition, J VAC SCI A, 19(5), 2001, pp. 2055-2060

Authors: Christou, C Garg, A Barber, ZH
Citation: C. Christou et al., Vapor-phase oxidation during pulsed laser deposition of SrBi2Ta2O9, J VAC SCI A, 19(5), 2001, pp. 2061-2068

Authors: Kim, IW Madan, A Guruz, MW Dravid, VP Barnett, SA
Citation: Iw. Kim et al., Stabilization of zinc-blende cubic AlN in AlN/W superlattices, J VAC SCI A, 19(5), 2001, pp. 2069-2073

Authors: Yasuda, HK Yu, QS Reddy, CM Moffitt, CE Wieliczka, DM
Citation: Hk. Yasuda et al., Effects of wall contamination on consecutive plasma processes, J VAC SCI A, 19(5), 2001, pp. 2074-2082
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